首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
ELECTRON BEAM PATTERN TRANSFER DEVICE AND METHOD FOR ALIGNING MASK AND SEMICONDUCTOR WAFER
摘要
申请公布号
EP0065143(B1)
申请公布日期
1986.03.26
申请号
EP19820103628
申请日期
1982.04.28
申请人
KABUSHIKI KAISHA TOSHIBA
发明人
MORI, ICHIRO;SUGIHARA, KAZUYOSHI;SHINOZAKI, TOSHIAKI;TOJO, TORU
分类号
H01L21/027;H01J37/304;H01L21/30;(IPC1-7):G03B41/00;H01L21/00;G03F9/00
主分类号
H01L21/027
代理机构
代理人
主权项
地址
您可能感兴趣的专利
ANORDNUNG ZUM EINFUEHREN EINER SPEISEFLUESSIGKEIT IN EIN FLUESSIGKEIT ENTHALTENDES DRUCKGEFAESS.
MEMORY CONTROL SYSTEM
RECEIVER FOR TACTICAL AIR NAVIGATION SIGNAL
THREE-WIRE TYPE BRIDGE RESISTANCE MEASURING CIRCUIT
TWO-POINT MONITOR TYPE EARTH DETECTOR
VALVE TIMING CONTROL DEVICE OF INTERNAL-COMBUSTION ENGINE
THERMOPILE
SCROLL FLUID MACHINE
PREPARATION OF BRANCHED OXYMETHYLENE POLYMER
DRINK FEEDER CONTAINING CARBONIC ACID GAS
POLYMERIZABLE COMPOSITION
STRENGTHENED ASSEMBLY OF PLURALITY OF JUXTAPOSED THERMOPLASTIC VESSEL, ITS MANUFACTURE AND ITS MANUFACTURING DEVICE
METHOD OF DELIVERING TAPE IN PACKER
METHOD OF REPAIRING PIPE JOINT SECTION OF EXISTING PIPE
MATERIAL FOR MANUFACTURING PRECISE PART OF BEARING SUBJECT TO DYNAMIC STRESS