发明名称 Method and apparatus for vacuum deposition plating.
摘要 <p>A method for vacuum deposition plating which comprises using a vacuum deposition plating apparatus having an inlet-side vacuum sealing device provided in front of a vacuum deposition plating chamber, an inlet-side inactive gas replacement chamber provided between the inlet-side vacuum sealing device and an annealing furnace, an outlet-side vacuum sealing device provided in the rear of the vacuum deposition plating chamber, an outlet-side inactive gas replacement chamber provided between the outlet-side vacuum sealing device and the atmosphere, and an inactive gas circulating/purifying device for circulating an inactive gas from vacuum chambers of both the vacuum sealing devices to atmospheric pressure chambers of both the vacuum sealing devices and for removing water, oil and oxygen from the inactive gas, said method for vacuum deposition plating being characterized by regulating concentrations of oxygen and hydrogen in the inactive gas after the purification to 60 ppm or less and 0.2 to 2.0%, respectively, and regulating a dew point of the inactive gas to -50 DEG C or less. A method for vacuum deposition plating which comprises using the above-mentioned vacuum deposition plating apparatus, characterized by regulating a pressure P1 in the annealing furnace to atmospheric pressure or more, a pressure P2 in the inlet-side inactive gas replacement chamber to atmospheric pressure or more, a pressure P3 in the outlet-side inactive gas replacement chamber to atmospheric pressure or more, a value if P1 - P2 to 0 mmAq or more, and a concentration of hydrogen in the inlet-side inactive gas replacement chamber to 2.0% or less, respectively. An apparatus for vacuum deposition plating which comprises the above-mentioned equipments for the vacuum deposition plating apparatus; a pressure gauge provided on the annealing furnace; a pressure gauge, a control valve, an automatic valve, a hydrogen concentration detector and a discharge valve provided on the inlet-side inactive gas replacement chamber; a pressure gauge and an automatic valve provided on the outlet-side inactive gas replacement chamber; and an automatic valve connecting to an inactive gas tank for emergency provided on the atmospheric pressure chambers of both the vacuum sealing devices.</p>
申请公布号 EP0175640(A2) 申请公布日期 1986.03.26
申请号 EP19850730123 申请日期 1985.09.16
申请人 MITSUBISHI JUKOGYO KABUSHIKI KAISHA;NISSHIN STEEL CO., LTD. 发明人 FURUKAWA, HEIZABURO HIROSHIMA SHIPYARD & EN. WORKS;WAKE, KANJI HIROSHIMA SHIPYARD & ENGINE WORKS;SHIMOZATO, YOSHIO HIROSHIMA TECHNICAL INSTITUTE;YANAGI, KENICHI HIROSHIMA TECHNICAL INSTITUTE;KATOH, MITSUO HIROSHIMA TECHNICAL INSTITUTE;WADA, TETSUYOSHI HIROSHIMA TECHNICAL INSTITUTE;TSUKIJI, NORIO C/O HANSHIN R & D LABORATORIES;AIKO, TAKUYA C/O HANSHIN R & D LABORATORIES;KITTAKA, TOSHIHARU C/O HANSHIN R & D LABORATORIES;NAKANISHI, YASUJI C/O HANSHIN R & D LABORATORIES
分类号 C21D9/56;C23C14/56;(IPC1-7):C23C14/56 主分类号 C21D9/56
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