ROTARY WASHING DEVICE FOR WAFER,申请号JP19840178390-传众专利搜索

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发明名称	ROTARY WASHING DEVICE FOR WAFER
摘要
申请公布号	JPS6158238(A)	申请公布日期	1986.03.25
申请号	JP19840178390	申请日期	1984.08.29
申请人	TOSHIBA CORP	发明人	SHIBATA KEIICHI
分类号	B08B3/02;B08B3/00;H01L21/304	主分类号	B08B3/02
代理机构		代理人
主权项
地址

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