| 摘要 |
An improved method of sputtering a platinum exhaust gas electrode onto a vitrified zirconia thimble for an electrochemical-type exhaust gas oxygen sensor, whereby porous high surface area films are consistently deposited at high rates of deposition. A DC magnetron cathode assembly having a magnetic field strength of at least 500 gauss across its target face is used at a sputtering power of 4 - 9 kilowatts. In a preferred embodiment of the invention, a thimble-target spacing of less than 3.0 cm, a pressure less than 1.33 Pascals (10 millitorr), a sputtering atmosphere consisting essentially of more than 50 percent nitrogen and/or oxygen, an electrically isolated deposition surface, and an electrically floating reference electrode precoated on the zirconia thimble surface, are used. |
