发明名称 ELECTROLESS COPPER PLATING SOLUTION
摘要 PURPOSE:To obtain the titled copper plating soln. having high stability, giving a plated film having superior mechanical properties such as elongation, and easy to treat when the soln. is discharged as waste liquor after use, by adding a stannate to a plating soln. contg. Cu ions, a complexing agent for Cu ions and a reducing agent for Cu ions. CONSTITUTION:A stannate such as sodium stannate is added to a plating soln. contg. Cu ions fed from copper sulfate or the like, a complexing agent for Cu ions such as EDTA, a reducing agent for Cu ions such as formaldehyde and a pH adjusting agent such as NaOH to obtain an electroless copper plating soln. having high stability and giving a plated copper film having superior mechanical properties such as elongation. The amount of the stannate added is >=about 0.005mol/l. When the copper plating soln. is discharged as waste liquor after use, BOD and COD of the waste liquor can be reduced easily.
申请公布号 JPS6156283(A) 申请公布日期 1986.03.20
申请号 JP19840175009 申请日期 1984.08.24
申请人 HITACHI LTD 发明人 AKABOSHI HARUO;MURAKAMI KANJI;KAWAMOTO MINEO;TADOKORO AKIO;WAJIMA MOTOYO
分类号 C23C18/40;(IPC1-7):C23C18/40 主分类号 C23C18/40
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