发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PURPOSE:To suppress liberation of impurities from a ceramics sintered member, by coating an Si2N4 or SiC film with a high purity on the surface of the ceramics sintered member. CONSTITUTION:A susceptor holder 5 is comprised of a base portion 5a over the surface of which a film 5b is coated. There base portion 5a has a principal element of powder ceramics consisting of sole material of Si3N4, SiC or AlN, or composite material of Si3N4 and Al2O2, and has a sintering assistant such as Y2O3, CeO2 Al2O2 or MgO added to be sintered and formed. After this sintered member is machined with polishing, over the entire surface an Si3N4 or SiC film 5b with a high purity is coated. Coating the film 5b can suppress liberation of impurities positively.
申请公布号 JPS6155918(A) 申请公布日期 1986.03.20
申请号 JP19840178056 申请日期 1984.08.27
申请人 TOSHIBA MACH CO LTD 发明人 KOMIYAMA KICHIZO
分类号 H01L21/205;C04B41/50;C04B41/87;H01L21/22;H01L21/31 主分类号 H01L21/205
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