发明名称 Automatic focusing apparatus for a semiconductor pattern inspection system
摘要 Disclosed is an automatic focusing apparatus which comprises an objective disposed in opposition to a substrate with patterns formed thereon, a first line sensor disposed at a first focal point of the focal length of the objective, second and third line sensors which are disposed closer to and farther from the objective by a given distance with respect to second and third focal points of the focal length of the objective, first to third differential circuits for differentiating the output signals from the first to third line sensors, a detecting circuit for detecting a displacement of the substrate from a predetermined proper distance between the objective and the substrate on the basis of the output signals from the first to third differential circuits, and a correcting device for correcting the displacement on the basis of the output signal from the detecting circuit. Thus, a single optical system is used for automatically correcting focus and pattern inspection.
申请公布号 US4577095(A) 申请公布日期 1986.03.18
申请号 US19830472604 申请日期 1983.03.07
申请人 TOKYO SHIBAURA DENKI KABUSHIKI KAISHA 发明人 WATANABE, TOMOHIDE
分类号 G01N21/88;G01N21/956;G03F9/00;H01L21/027;H01L21/66;(IPC1-7):G01V1/20 主分类号 G01N21/88
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