发明名称 |
Apparatus for electron beam lithography |
摘要 |
An apparatus for electron beam lithography comprises at least one mask equipped with a polygonal aperture to be subjected to an electron beam from an electron beam generator, an electron lens system for demagnifying and imaging the polygonal aperture of the mask, and a solenoid coil for electron beam rotation adjustment placed between the mask and the final-stage electron lens.
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申请公布号 |
US4577111(A) |
申请公布日期 |
1986.03.18 |
申请号 |
US19830516091 |
申请日期 |
1983.07.22 |
申请人 |
HITACHI, LTD. |
发明人 |
SAITOU, NORIO;OZASA, SUSUMU;MATSUZAKA, TAKASHI |
分类号 |
G03F7/20;H01J37/30;H01J37/317;H01L21/027;H01L21/30;(IPC1-7):H01J37/26 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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