首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
X-RAY EXPOSURE PROCESS
摘要
申请公布号
JPS6154623(A)
申请公布日期
1986.03.18
申请号
JP19840176221
申请日期
1984.08.24
申请人
NEC CORP
发明人
OKADA KOICHI
分类号
G03F7/20;H01L21/027;H01L21/30
主分类号
G03F7/20
代理机构
代理人
主权项
地址
您可能感兴趣的专利
MEAT WRAPPING APPARATUS
ORGANIC COMPOUNDS
TEXTCALL COMMUNICATION SYSTEM
IONOMER COMPOSITIONS,PROCESSES FOR THEIR PREPARATION,USES AND CONVERSION PROCESSES THEREFOR
RACKS FOR ELECTRONIC EQUIPMENT
MEASUREMENT APPARATUS
TIDY BOOT
SPORTING APPARATUS
METHOD AND APPARATUS FOR DISPENSING CUPS AND VENDING MACHINES FOR BEVERAGES
A DIVIDER
BABY BOOMER
ACTIVE PRESSURE PAD FOR MANUFACTURING WOOD LAMINATED COMPONENTS
THE ARTIFICIAL ROOT AND THE ARTIFICIAL ROOT PROPAGATOR
A STACKABLE REFUSE BIN
MEMBRANE SYSTEM
REMOTELY ACTUATED SWITCH AND PROTECTION CIRCUIT
A HINGE ASSEMBLY
NOISE REDUCTION CIRCUIT
NOVEL PROCESS
FLOW DETECTING SYSTEMS