发明名称 EVALUATION OF THIN FILM
摘要 <p>PURPOSE:To enable the quantitative evaluation of a thin film with high sensitivity, by simple constitution such that the damage of the thin film by the irradiation of large output energy is evaluated by measuring the propagation loss of incident guided light. CONSTITUTION:Incident beam 7 such as laser beam is guided through the specimen thin film on a glass substrate 1 through an incident coupler 3 as shown by a numeral 8 and the emitted beam 9 is received by a power metal 6 through an emitting coupler 4. At this time, the distance between the incident coupler 3 and the emitting coupler 4 is set at plural places and the power of emitted beam 9 at each position is measured to calculate the propagation loss of the guided beam 8 in the thin film 2. Next, large output laser beam 10 is allowed to irradiate the thin film 2 by a condensing lens 5 and the propagation loss of the guided beam 8 is measured by generated damage. By this method, the quantitative evaluation of the thin film is obtained with high sensitivity by simple constitution.</p>
申请公布号 JPS6153540(A) 申请公布日期 1986.03.17
申请号 JP19840174089 申请日期 1984.08.23
申请人 CANON INC 发明人 SAWAMURA MITSUHARU;OTANI MINORU;ITO SUSUMU
分类号 G01M11/00;G02B6/12 主分类号 G01M11/00
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