发明名称 AMORPHOUS SILICON ELEMENT
摘要 PURPOSE:To improve the quality and reliability by leaking static electricity by a method wherein an amorphous Si film sliding out of the opposite electrode is partly treated by resistance reduction. CONSTITUTION:A part 5 treated by resistance reduction is reduce in resistance to a size of about 100mum diameter on heat-fusion by irradiating the amorphous Si film 3 with laser beams. This manner makes resistance value between the upper electrode 4 and the lower one 2 with the interposal of said part 5 much smallr than the resistance value 500KOMEGA-500MOMEGA of the Si film 3 and can protect solar cells by leaking voltages about 5,000V-50kV generated by static electricity.
申请公布号 JPS6151981(A) 申请公布日期 1986.03.14
申请号 JP19840173307 申请日期 1984.08.22
申请人 HITACHI LTD;HITACHI DEVICE ENG CO LTD 发明人 ORITSUKI RYOJI;SUNAHARA KAZUO;SHIROHASHI KAZUO;KIN KIICHI;SUZUKI KENKICHI
分类号 H01L31/04;H01L31/20 主分类号 H01L31/04
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