发明名称 |
AMORPHOUS SILICON ELEMENT |
摘要 |
PURPOSE:To improve the quality and reliability by leaking static electricity by a method wherein an amorphous Si film sliding out of the opposite electrode is partly treated by resistance reduction. CONSTITUTION:A part 5 treated by resistance reduction is reduce in resistance to a size of about 100mum diameter on heat-fusion by irradiating the amorphous Si film 3 with laser beams. This manner makes resistance value between the upper electrode 4 and the lower one 2 with the interposal of said part 5 much smallr than the resistance value 500KOMEGA-500MOMEGA of the Si film 3 and can protect solar cells by leaking voltages about 5,000V-50kV generated by static electricity. |
申请公布号 |
JPS6151981(A) |
申请公布日期 |
1986.03.14 |
申请号 |
JP19840173307 |
申请日期 |
1984.08.22 |
申请人 |
HITACHI LTD;HITACHI DEVICE ENG CO LTD |
发明人 |
ORITSUKI RYOJI;SUNAHARA KAZUO;SHIROHASHI KAZUO;KIN KIICHI;SUZUKI KENKICHI |
分类号 |
H01L31/04;H01L31/20 |
主分类号 |
H01L31/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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