| 摘要 |
PURPOSE:To prevent troubles such as crystal defects from occuring from a etched lower edge portion of a lower layer, by making the edge portion a non- acute angle. CONSTITUTION:An resist film 7 and an upper layer 1 of a member to be etched consisting of the upper layer 11 and a lower layer 2 are taper-etched. The taper portion 11 as well as the lower layer 2 are etched. The junction portion between a rising face 5 and a plane face 6, being positioned at the lower edge portion 4 of the portion 3 to be etched away in the lower layer 2 becomes a non-acute angle. Removing the resist 7 provides a desired member. Since portions outside of the lower edge portion 4 and the vicinities it being rised approximately vertically, a convertion difference with the mask is small at the time of being etched and therefore the member can be precisely processed. |
