发明名称 CONDUCTIVE MASK DRAWING
摘要 <p>PURPOSE:To perform equipotential inspection between elements and inspect connections easily and securely by recording wiring connections between elements in the mask layout drawing of a semiconductor integrated circuit with conductive ink. CONSTITUTION:The aluminum wiring parts (hatched in figure) between elements in the mask layout drawing of the semiconductor integrated circuit is recorded with the conductive ink. Then, continuity of a terminal of a resistance R1, the collector terminal of a transistor (TR) Q1, a terminal of a resistance R2, and the collector terminal of a TRQ2 is checked by using a tester to inspect the circuit. Consequently, the opening of a fine gap between, for example, the resistances R1 and R2 which is difficult to be found by manual inspection is easily detected and connection inspection is performed easily and securely.</p>
申请公布号 JPS6151149(A) 申请公布日期 1986.03.13
申请号 JP19840173612 申请日期 1984.08.21
申请人 NEC CORP 发明人 SUGAWA KEIKO
分类号 G03F1/00;G03F1/84 主分类号 G03F1/00
代理机构 代理人
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