发明名称 POWER SUPPLY FOR GAS DISCHARGE LASERS
摘要 <p>A high voltage power supply for energizing a gas discharge laser (10) in either an enhanced pulse mode or a continuous mode, which power supply is simple to manufacture and minimizes the voltage that other parts of the energizing circuit are required to withstand. The voltage provided by a high voltage DC power supply (36) is boosted by the interaction of first and second reactive components (44, 42). A first reactance (44) is provided which stores charges at a boosted potential. This charge is provided to the laser to initiate electrical breakdown. The second reactance (42) generates a potential which is additive with respect to the potential provided by the high voltage DC power supply so that the first reactance (44) is charged to a potential equal to the generated potential plus the potential of the high voltage power supply (36).</p>
申请公布号 WO1986001648(A1) 申请公布日期 1986.03.13
申请号 US1985001701 申请日期 1985.09.06
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