| 摘要 |
<p>PURPOSE:To obtain a color filter which permits color sepn. to three primary colors or the complementaty color relation therewith by forming a gamma-Al2O3 layer whidh is selectivity dyed onto the substrate of a solid state image pickup device, disposing selectively a dichroic film having the color transparancy different from said layer onto said layer. CONSTITUTION:A thin Al film 2 deposited by evaporation is formed on a silicon wafer 1 formed thereon with the solid state image pickup element and thereafter a desired resist pattern 3 is formed thereon and after an Al2O3 layer 2' is formed by anodizing the exposed Al film, said layer is dyed by a yellow dye and the pattern holes of the dyed layer 2' are closed by hot steam. The pattern 3 is removed an thereafter a resist 4 is again coated thereon and the layer 2 except the layer 2' pattern is exposed. After the exposed layer 2 is etched away, a resist film 5 for lift off is formed on the wafer 1 and the desired pattern film 5 is obtd. The dichroic film 6 having the filter characteristic of cyan is formed on the exposed yellor Al2O3 layer 2' and the remaining film 5. The filter of the yellow Y, green G and cyan C having the excellent resistance to heat, chemicals, etc. is thus obtd.</p> |
