| 摘要 |
PURPOSE:To form a sufficiently thick protective film without generating cracks by dividing a bonding pad into the plural. CONSTITUTION:Al or an Al alloy is used as the principal ingredient. Conductor layers 1 consisting of the alloy, etc. form one electrode sections on four divided surfaces. A continuous contact area between a conductor metal constituting the electrode and an insulating film is quartered approximately by forming the electrode section in such structure. Accordingly, no crack is generated even when the insulating film consisting of SiO2 or PSG through a CVD method in thickness such as 2.0-2.5mum is grown. |
