| 摘要 |
PURPOSE:To form precisely a thin film pattern, by inserting a shutter plate made of ferromagnetic material into an air gap defined on the magnet side facing a substrate, being movable between a first position covering the magnet side facing the substrate and a second position not covering the side. CONSTITUTION:Between magnets 7 in heat equalizing plate 3 and the plane contacting a substrate1, an air gap 8 is defined, in which a ferromagnetic shutter plate 9 is inserted. Since the shutter plate 9 is positioned at a second position not coverng the magnets 7 during producing a thin film, a mask 2 is attracted toward the magnets 7 to close contact the substrate face, so that an amorphous Si film is formed precisely according to the pattern of the mask 2. When the thin film production is completed and the mask 2 is to be removed, the shutter plate 9 is transferred to a first position below the magnets 7 to form a magnetic circuit between the magnets and the substrate to reduce the attraction of the mask, facilitating the removal. |
