| 摘要 |
<p>An optical substrate of KCl is heated to 140-170 degrees C. in a vacuum chamber which also contains a heated evaporator for TlI so that a thin film (a) of TlI in the cubic phase is formed on the substrate at a speed of min. 500 angstroms/minute. Film (a) then transforms into its table orthorhombic phase. The chamber is pref. below 10-5 torr, and the TlI evaporator heated to 170-200 degrees C., esp. 170 degrees C., using high purity TlI in a chemically inert, isothermal evaporator with a small exit hole, the substrate being at 140 degrees C and the deposition speed 2000 angstroms/minute. The result is esp. a transparent, polycrystalline TlI film with random orientation, on the KCl substrate. Used for example, as a protective film on a laser outlet window mad of KCl; on optical elements in infrared appts.; or as high quality, antireflection coatings.</p> |
