| 摘要 |
<p>PURPOSE:To avoid the direct application of pressure and heat to the active region from a whisker lead by a method wherein projection electrodes are formed at positions other than that of the active region and thus brought into contact with the whisker lead. CONSTITUTION:The whisker lead 2 is in contact with projection electrodes 6a- 6d formed at parts located on an oxide film 8, of a double-layer metal 7 made of a Schottky barrier forming metal and a lead-out electrode metal. This structure does not allow the direct application of pressure from the lead 2 to the active region 5 because of the formation of the electrodes 6a-6d at positions other than that of the active region and because of their contact with the lead 2. Besides, the presence of a space between the region 5 and the lead 2 causes little thermal conduction to the region during sealing.</p> |
