发明名称 FILM FORMING METHOD
摘要 PURPOSE:To form uniformly a thin film on a large substrate by controlling the electric power consumption of plural sets of counter electrodes for each of the sets to discharge electricity, converting a discharge gas to plasma, irradiating UV rays so as to arrive on the substrate and photodecomposing the photochemically reactive gas. CONSTITUTION:A discharge region 1 where the discharge gas such as rare gas supplied from a pipe 3 is converted to plasma by an electrode 2 and a reaction region 7 where the substrate 6 is disposed on a substrate holding base 5 and the photochemically reactive gas such as silane is supplied from a pipe 4 are enclosed by separate vessels or by one vessel without blocking said regions. The above-mentioned discharge gas is converted to the plasma in said vessel and the UV rays are radiated thereto to photodecompose the above-mentioned photochemically reactive gas. The resulted product of the decomposition is deposited on the above-mentioned substrate 6 by which the film formation is executed. The above-mentioned electrode 2 is constituted with plural sets of the electrode 2a, b... which are disposed to face each other and the above-mentioned plasma is formed by the bar-shaped discharge formed between the electrodes 2 in the stage of forming the film in the above-mentioned manner. The power consumption for the discharge of at least one set of electrode 2a is controlled by the power source separate from the other sets of the electrodes 2b..., by which the formation of the uniform film is made possible.
申请公布号 JPS6156279(A) 申请公布日期 1986.03.20
申请号 JP19840175868 申请日期 1984.08.25
申请人 TARUI YASUO;USHIO INC 发明人 TARUI YASUO;HIRAMOTO TATSUMI
分类号 C23C16/24;C23C16/48;H01L21/205;(IPC1-7):C23C16/48 主分类号 C23C16/24
代理机构 代理人
主权项
地址