| 摘要 |
PURPOSE:To obtain substrate of good heat dissipation and light weight by a method wherein an aluminum plate is subjected to anodic oxidation in an electrolyte containing oxalic acid, thus forming an anodic oxide film of a specific thickness on its surface. CONSTITUTION:The aluminum plate is subjected to anodic oxidation in the electrolyte containing exalic acid, thus forming the anodic oxide film of 1-20mum thickness on its surface. The anodic oxide film formed by anodic oxidation in the electrolyte containing oxalic acid does not contain electrolytic anions of large dissociation constant and contains a very small amount of moisture adsorption; therefore, the electric insulation of the oxide film improves, and the resistance value increases. A film thickness of the anodic oxide film of less than 1mum leads to the possibility of insulation breakdown due to scratches, etc. in handling in the case of use as the substrate for the solar cell, whereas an excess of 20mum causes cracks by the increase in substrate temperature at the time of CVD, resulting in a large possibility of insulation breakdown. |
