| 摘要 |
PURPOSE:To prevent a crack from being generated, and to cause no peeling, when an amorphous silicon thin film has been cut to desired length, by forming an amorphous silicon non-existence area by containing a cutting plane line. CONSTITUTION:An amorphous silicon film is formed by joining a substrate and a mask member together and feeding them at the same speed. By the first roller 1 and the second roller 2, a flexible substrate material is fed, and the substrate 5 is long and shaped like a tape, and wound in advance around the first roller 1. The tape-shaped substrate 5 is fed out in the longitudinal direction from the first roller 1, and the second roller 2 is provided so as to be opposed to the first roller 1, and winds up the subsrate 5. The third roller 3 and the fourth roller 4 feed the mask member 6 for forming an amorphous silicon non-existence area. If an interval exists, silicon goes round, and the amorphous silicon film is formed under the mask, too, therefore, the mask member 6 must be in contact with on the substrate 5. |
