发明名称 |
Process for reduction at low temperature for the manufacture of photomasks |
摘要 |
Glass photomasks which have a high-definition pattern for use in photographic manufacturing processes are manufactured by causing colouring ions to penetrate below the surface of the glass and by reducing and aggregating the colouring ions using pure hydrogen under pressure at a relatively moderate temperature. A coloured pattern with very high definition is thus obtained.
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申请公布号 |
CH654563(A5) |
申请公布日期 |
1986.02.28 |
申请号 |
CH19820007019 |
申请日期 |
1982.12.02 |
申请人 |
PPG INDUSTRIES, INC. |
发明人 |
ERNSBERGER, FRED MARTIN |
分类号 |
C03C21/00;C03C23/00;(IPC1-7):C03C21/00 |
主分类号 |
C03C21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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