发明名称 Process for reduction at low temperature for the manufacture of photomasks
摘要 Glass photomasks which have a high-definition pattern for use in photographic manufacturing processes are manufactured by causing colouring ions to penetrate below the surface of the glass and by reducing and aggregating the colouring ions using pure hydrogen under pressure at a relatively moderate temperature. A coloured pattern with very high definition is thus obtained.
申请公布号 CH654563(A5) 申请公布日期 1986.02.28
申请号 CH19820007019 申请日期 1982.12.02
申请人 PPG INDUSTRIES, INC. 发明人 ERNSBERGER, FRED MARTIN
分类号 C03C21/00;C03C23/00;(IPC1-7):C03C21/00 主分类号 C03C21/00
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