发明名称 METHOD AND APPARATUS FOR VACUUM VAPOR DEPOSITION
摘要 PURPOSE:To obtain vapor deposited film having uniform thickness even on complicated shape surface, by exhausting bell jar inside to high vacuum, then introducing inert gas to decrease the vacuum degree, and vaporizing a metal in the atmosphere. CONSTITUTION:A rack 5 supporting the materials 6 to be vapor deposited is arranged at prescribed positions in the bell jar 2, and Al foil, etc. is mounted on a vaporizing boat 9. A pump 3 is driven to exhaust inside the jar 2 to high vacuum, then inert gas is introduced from a supplying pipe 4 to decrease the vacuum degree, e.g. to about 9X10<-4>-1X10<-4>Torr. If vapor depositing process is carried out in the atmosphere, vaporized molecules of Al, etc. collide with inert gas molecules and the advancing path is varied. Thus, vaporized molecules are spreaded thoroughly to whole corners of a vaporizing surface of the material 6, and vapor deposited film having uniform thickness is formed on the surface 10 without unevenness.
申请公布号 JPS6141765(A) 申请公布日期 1986.02.28
申请号 JP19840163429 申请日期 1984.08.02
申请人 KOITO MFG CO LTD 发明人 WATANABE TOSHIO;TAMURA YOSHITAKA;TAKESHITA FUMIO
分类号 C23C14/24;C23C14/22 主分类号 C23C14/24
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