发明名称 |
FIELD FEECT TRANSISTOR AND MANUFACTURE THEREOF |
摘要 |
PURPOSE:To improve the accuracy of a gate electrode length by determining the length of a direction for coupling a source electrode to a drain electrode according to the thickness of a conductive layer as a laminar layer corresponding to a gate electrode. CONSTITUTION:A laminar layer 4 having a window 3 at a single crystal semiconductor substrate 1 and a single crystal semiconductor layer 9 extending from the upper surface of the layer 4 in contact with the inner surface of the window 3 on the region faced with the window 3 are formed. The layer 3 is formed of a conductive layer 5, the first electrode 16 is ohmically contacted with the substrate 1, and the second electrode 13 is ohmically contacted with the layer 9. |
申请公布号 |
JPS587879(A) |
申请公布日期 |
1983.01.17 |
申请号 |
JP19810105828 |
申请日期 |
1981.07.06 |
申请人 |
NIPPON DENSHIN DENWA KOSHA |
发明人 |
HORIGUCHI KATSUJI;SUDOU TSUNETAKA;KASAI RIYOUTA |
分类号 |
H01L29/78;H01L29/80 |
主分类号 |
H01L29/78 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|