发明名称 VACUUM EXHAUSTER FOR SEMICONDUCTOR PRODUCING DEVICE
摘要 PURPOSE:To produce high quality semiconductor without contaminating the interior of vacuum container with oil by constructing the rough exhaust pump with an ejection pump employing the compressed gas as the working fluid. CONSTITUTION:When roughly exhausting a vacuum container for semiconductor producing system 1, a valve 4 is opened while a valve 5 is closed to constitute a rough exhaust pump and to operate an ejection pump 21 employing compressed fluid as the working fluid. In other word, compressed air is fed to a nozzle tube 26 and ejected through a nozzle port 26A into the diffuser section 25. Consequently ejector function is achieved to suck the gas molecules in the vacuum container through a suction port 23 into the pump and discharge through a discharge port 24. Consequently, vacuum exhaustion can be achieved without contaminating the interior of the vacuum container with oil or decomposed matter resulting in production of high quality semiconductor.
申请公布号 JPS6138200(A) 申请公布日期 1986.02.24
申请号 JP19840157501 申请日期 1984.07.30
申请人 HITACHI LTD 发明人 KOBARI TOSHIAKI;UEDA SHINJIRO;ITO AKIKO
分类号 F04B37/16;F04F5/20;H01L21/203;H01L21/302;H01L21/3065 主分类号 F04B37/16
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