| 摘要 |
PURPOSE:To provide the titled device capable of forming uniformly a thin film consisting of plural components on a substrate by fixing the substrate to an oscillating support, and facing the substrate successively to plural vaporization sources which are furnished to a fixing stand. CONSTITUTION:A substrate 11 is attached to a substrate support 4 equipped with a heating or a cooling means for heating or cooling the substrate, and oscillated with an axial point 6 as the center. Meanwhile, plural vaporization sources 13, 14, 15, and 16 are fixed to a fixing stand 12, and each vaporizing direction is directed to said axial point 6. Said vaporization sources 13, 14, 15 and 16 are vaporized by ion impact, heating, etc., and the substrate 11 is heated or cooled as required. Besides, time of facing of the substrate to each evaporation source 13, 14, 15 and 16 is changed in accordance with the desired composition of a vapor-deposited film. |
