| 摘要 |
PURPOSE:To certainly keep the vacuum of a vacuum chamber, in an apparatus for applying vacuum treatment to a semiconductive substrate, by exposing the part, which has an area larger than the opening area of the valve seat in the side of a load lock chamber, of a drivable valve body in the side opposed to the vacuum chamber. CONSTITUTION:A numeral 8 shows bellows provided in order to expose the surface of a valve body 3, which is opposed to a vacuum chamber 1, to the open air, a character (a) shows the diameter of the opening part of the valve seat in the side of a load lock chamber 2 and a character D shows the diameter, which is exposed to the open air in the side opposed to the vacuum chamber 1, of a valve body 3. Because the valve body 3 of a gate valve receives atmospheric pressure when a lid 6 is opened at the time of the feed-in and feed-out of an object to be treated and the vacuum of the load lock chamber 2 is broken, the gate valve holds a closed state and, therefore, the valve body 3 must be pushed upwardly. By this method, even when the drive source for the valve body of the gate valve between the load lock chamber and the vacuum chamber is cut off, the vacuum of the vacuum chamber can be kept certainly. |
