| 摘要 |
PURPOSE:To prevent the abrasion of a high-permeability thin film and to keep the precision obtained when a pattern is formed by forming a highly abrasion-resistant protective layer to cover the first reinforcing member, and then joining the second reinforcing member. CONSTITUTION:A high-permeability thin film 5 is sputtered on the first reinforcing member 12, and then a protective layer 13 of silicon dioxide is formed to cover the thin film 5. The surface of the protective layer 13 is joined to the second reinforcing member 12' having almost the same structure as the first reinforcing member 12 through a joining layer 14 to form a main magnetic pole. Consequently, the abrasion of the high-permeability thin film 5 in a polishing stage or by the traveling of the recording medium is prevented, and the width and thickness of a track are not changed. Accordingly, the precision obtained when a pattern is formed can be maintained for a long period. |
