| 摘要 |
PURPOSE:To set easily, surely and most adequately conditions for the flow of gas and to form a uniform film by observing the flow of the microparticles contained in the gas flowing in the reaction chamber of a CVD device and obtaining the information on the flow of the gas. CONSTITUTION:The liquid of TiCl4 in the vessel 5 of a gas supply system B is evaporated by an inert gas such as He supplied from a cylinder and is introduced into the reaction chamber A of the CVD device provided with a substrate holder 2 for holding the substrate 1 and a perforated plate 3 for ejecting the gas; at the same time, water 6 is supplied in the form of steam by a heater 7 and is mixed with the vapor at the inlet of the plate 3 to form many pulverous particles of TiO2. Such particles are admitted together with the inert gas into the vessel and are discharged through a discharge port 4 by a discharging system C. On the other hand, the light from a light source 15 of an illuminating system D is passed through lenses 16, 17 and a slit 17 to illuminate the inside of the chamber A through transparent glass 19 as the plane rays. The locus of the flow of the above-mentioned pulverous TiO2 particles is visually observed or subjected to image pickup, by which the information on the flow of the gas is obtd. |
