Apparatus for introducing a process gas into a treatment chamber

摘要

A process gas is introduced into a treatment chamber (40) through a horizontal spiral gas supply duct (30) having a tangential inlet (31) and opening to a pair of concentric, inner and outer annular gas inlet ducts (12,22) surrounding a liquid spray apparatus (2). Partition means (32) divide the spiral supply duct (30) into independent inner and outer sub-ducts (34,36) which define separate inner and outer flow passages (44,46) connected respectively to the inner and outer annular gas inlet ducts (12,22). Damper means (70) is provided in the inlet to the outer sub-duct (36) to selectively control the flow of process gas (7) therethrough as a means of maintaining the velocity of the flow of process gas (5) through the inner flow passage (44) above a minimum acceptable velocity.