| 摘要 |
PURPOSE:To decrease the transfer area of a wafer and as well to eliminate the affection of dust upon the wafer, by providing a means for holding a transferred material, a pivotable arm connected to the former and a means for rectilinearly moving the arm. CONSTITUTION:A wafer 16 which has been previously aligned, is fed into by means of a parallel motion linkage 1 without the posture of the wafer being altered, and an angular amount which is obtained by converting the movement of a rectilinear motion guide 4 with the use of a pinion 12 is transmitted to a reciprocating motion linkage 6 to rotate an arm in the parallel motion linkage 1 by means of a parallel motion lever control rod 7 so that the trajectory 17 of wafer supply transfer motion is obtained. Further, a hand block 2 is lowered in association with the motion of a cylindrical cam 5 to disengage the pinion 12 from the parallel motion linkage 6 to obtain a rectilinear motion 18. Further, the pinion 12 is engaged with the parallel motion linkage 6 to advance the rectilinear motion guide 4 to obtain an empty hand retrieving motion 19. Thereafter, the hand block 2 is lowered to obtain a rectilinear retraction 20 while the parallel motion linkage 1 is left to be stopped. |
