| 摘要 |
PURPOSE:To easily polish a free curved surface in high accuracy, by providing a means, in which a polisher provided in the end of a vertically moving spindle is relatively moved for a workpiece on the basis of data in a polishing data stored part, and a polishing pressure adjusting means. CONSTITUTION:A polisher 2, to which a polishing pressure Wg is applied through a spring 7 and a loading bar 8 by regulating a polishing head part 3, is floated with a fixed gap (g) between the polisher 2 and a workpiece 6, and the gap (g) is determined by a shape, rotary speed and a polishing pressure of the polisher 2 and viscosity of a solution. Next, a polishing device, comparing measured data with desired polishing shape data after the preceding polished shape of the workpiece 6 is measured, obtains polishing speed data of the workpiece 6 in each position X, Y to be stored in a polishing data stored part 13 provided in the polishing head part 3. The device, moving on the basis of this polishing speed data an XY table part 12 and polishing the workpiece 6, enables the workpiece to be polished in the desired shape by variably controlling a polishing speed because a polishing quantity is determined by a relative speed between the polisher 2 and the workpiece 6. |
