发明名称 |
Actinic radiation activated hydrosilation reaction compsn. |
摘要 |
<p>Compsn. suitable for effecting a hydrosilation addn. process on exposure to actinic radiation comprises (A) an Si cpd. contg. at least one Si-bonded H atom, there being not more than 2H atoms attached to any one Si atom; (B) a cpd. contg. aliphatic (pref. olefinic) unsatn.; and (C) a Pt complex having a UV-displaceable gp., pref. an (eta-diolefin) (sigma-aryl) Pt complex. Cpds. (A) and (B) can be monomeric or polymeric.</p> |
申请公布号 |
ES8601219(A1) |
申请公布日期 |
1986.02.16 |
申请号 |
ES19810005301 |
申请日期 |
1984.03.01 |
申请人 |
MINNESOTA MINING AND MANUFACTURING COMPANY |
发明人 |
|
分类号 |
C08L83/00;B01J31/22;C07B61/00;C07F7/08;C08G77/08;C08G77/38;C08K5/56;C08L83/07;C09D183/04;C09D183/07;C09J7/02;(IPC1-7):C07F7/18;B01J31/16 |
主分类号 |
C08L83/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|