发明名称 IC DEVICE
摘要 PURPOSE:To allow the titled device to be excellent in bondability and show a high corrosion resistance in the state of being sealed by plastic molding by a method wherein metallic wiring bands between elements or in elements are formed on an aluminum alloy containing noble metal. CONSTITUTION:Metallic wiring bands between semiconductor elements or in the elements are formed of an alluminum alloy containing a kind or more of noble metal. Said noble metal should be a kind or more from among e.g. palladium and platinum: the noble metal contained in the aluminum alloy is dissolved in a grain or in a grain boundary, not forming the intermetallic compound with aluminum, or is made to deposit the intermetallic compound with a grain size of 0.3mum or less by uniform dispersion in the grain or over the grain boundary. This manner yields the titled device of resin-sealed type excellent in bondability having a high corrosion resistance against chlorine ions or high-temperature vapor.
申请公布号 JPS6132444(A) 申请公布日期 1986.02.15
申请号 JP19840153720 申请日期 1984.07.24
申请人 HITACHI LTD 发明人 KAWABUCHI YASUSHI;ONUKI HITOSHI;KOIZUMI MASAKIYO
分类号 H01L21/3205;H01L23/52;H01L23/532 主分类号 H01L21/3205
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