发明名称 METHOD OF REVERSING TRANSPARENT MASK
摘要 1. Method of repairing transmission masks using contamination polymerisation, characterized in that in a vacuum system a precisely focused electron beam is moved line by line over an undesired mask opening, or along the edge of the mask opening in order to close the opening completely by the contamination filament following the beam, or to correct the form of the mask opening, and in that the repaired mask opening is replenished from the mask back with a conductive material, that the polymeric structure applied with the electron beam is removed, and a gold layer is vapor deposited or sputtered onto the front and back of the mask.
申请公布号 JPS6132426(A) 申请公布日期 1986.02.15
申请号 JP19850079462 申请日期 1985.04.16
申请人 INTERNATL BUSINESS MACH CORP 发明人 UBE BEERINGAA;HARARUDO BOOREN;PIITAA BUETEIGERU;BUERUNAA ZAPUKA
分类号 H01L21/027;G03F1/00 主分类号 H01L21/027
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