发明名称 Method of and system for opto-electronic inspection of a two-dimensional pattern on an object
摘要 In a method of opto-electronic inspection of a two-dimensional pattern on an object, especially a printed board, a micro-inspection is carried out by subjecting line-by-line scanned picture elements in pixel-by-pixel fashion to a sequence of picture operations for inspection of dimensions and spacings, and the respective result is compared with the corresponding scanned pixel. At the same time a macro-inspection is carried out by combining the scanned pixels to frames and by respective reduction thereof to a single characteristic picture information, whereupon a comparison is again performed, but this time with the corresponding picture information of a reference picture. In this way it is possible to perform a quick and fully automatic real-time inspection of two-dimensional patterns, for instance printed boards, both for minute and hardly visible defects and for macro-defects.
申请公布号 US4692943(A) 申请公布日期 1987.09.08
申请号 US19840686663 申请日期 1984.12.27
申请人 DR. LUDWIG PIETZSCH GMBH 发明人 PIETZSCH, LUDWIG;OVERLACH, KNUD;SENGER, DETLEF;BREUNIG, WALTER
分类号 G06T1/00;G06T7/00;(IPC1-7):G06K9/00 主分类号 G06T1/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利