| 摘要 |
PURPOSE:To perform an a-Si photosensor having a film not separated, and uniform and preferable performance by forming a photoconductive layer of a laminated film of two or more layers having different refractive indexes, and setting the refractive index of the lowermost layer of the laminated film to the prescribed value or lower. CONSTITUTION:An a-Si layer 2 having 3.2 or lower of refractive index in a light having 6,328Angstrom of wavelength is formed by a glow discharging method on a glass substrate 1. Then, a discharging voltage is reduced to perform a glow discharge, and the second a-Si layer 3 having different refractive index from the lowermost layer 2 is accumulated. Then, electrodes made of an N<+> type layer 4 and a conductive layer 5 of an ohmic contact layer is formed. Thus, an a-Si photosensor having low cost, high bondability and uniformity can be obtained. |
