发明名称 PLASMA TREATING DEVICE
摘要 PURPOSE:To etch uniformly a sample at a high speed or to form a uniform and thick film on the sample by providing magnetic field generating means for electrically generating a magnetic field continuously movable in the prescribed direction. CONSTITUTION:A vessel is separated by a cathode into an etching chamber 13 and a magnetic field generator containing chamber 14. A magnetic generator 40 made of a magnetic core 20 and a coil 30 is disposed oppositely to the lower surface of the cathode 12 in the chamber 14. The coil 30 is formed of coils 31a, 31b, 31c. When 3-phase AC currents having 120 deg. different positions are respectively flowed to the coils 31a, 31b, 31c, a traveling magnetic field which moves in the prescribed direction as time elapses is generated on the cathode 12.
申请公布号 JPS6129128(A) 申请公布日期 1986.02.10
申请号 JP19840150202 申请日期 1984.07.19
申请人 TOSHIBA CORP 发明人 MORISHITA AKIHIRA;AZUSAWA TERUO;YAMAZAKI TAKASHI
分类号 H01L21/302;H01J37/34;H01L21/3065 主分类号 H01L21/302
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