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发明名称
HEAT TREATMENT PROCESS AND DEVICE OF SEMICONDUCTOR WAFER
摘要
申请公布号
JPS6127625(A)
申请公布日期
1986.02.07
申请号
JP19840149038
申请日期
1984.07.18
申请人
DEISUKO SAIYAA JAPAN:KK
发明人
HERUMUUTO SAIYAA
分类号
H01L21/22
主分类号
H01L21/22
代理机构
代理人
主权项
地址
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