| 摘要 |
PURPOSE:To evaluate a manufacturing process as to cleanliness in a highly sensitive, nondestructive way by a method wherein a quartz object to be used for the diffusion of impurity into a silicon substrate to be used for the manufacture of a semiconductor device or the like is subjected to radiation and the change in color produced by the radiation is studied. CONSTITUTION:X-ray are thrown upon a quartz object such as a tube or jig that is the test specimen and the resultant coloring is observed by the naked eye. Such coloring is attributable to impurities present in the quartz. For example, a test piece that is a quartzs plate not containing impurities is accommodated for a certain period of time in a heat treatment furnace for use in an impurity- diffusion process, and then taken out to be subjected to X-ray radiation. A study of the degree, tone, and density of the coloring reveals the degree of contamination inside the heat treatment furnace and the type of the contaminant responsible for the coloring. |
