| 摘要 |
A photosensitive polymer comprises (a) a polymer of formula (I);(b) photosensitive additives, such as C6H4XR5CO2YNR3R4and C6H4 XR5NR3R4; and (c) a sensitizing agent (s) as required. R1 is trior tetra- atomic(sic) organic radical; R2 is a di-atomic(sic ; divalent) organic radical ; M is H, an alkaline metallic ion or an ammonium ion ; n is 0 or 1 ; X is N3 - or N3SO2; Y is H, alkyl, alkoxy, nitro, carboxyl, or sulfonic acid gp. or halogen; R3 is a diatomic organic radical, coupling Ar and R ; R4 and R5 are H or a lower alkyl radical.
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