| 摘要 |
For forming an array or series of elementary beams of charged particles, a beam exposure device includes a mirror system having a matrix of sub-mirrors. Using such a composite mirror, a multiple beam image is formed in a location which deviates from the position of the cross-over of principal rays of the elementary beams. Consequently, the elementary beams, which may alternatively be ion beams, can be separated modulated and controlled. For suitable imaging, such as the writing of patterns for a micro-electronic circuit element, the images and the cross-over of the principal rays of the elementary beams are combined. For this purpose, use is made of a second mirror whose sub-mirrors have an optical effect which opposes that of the first mirror.
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