发明名称 APPARATUS FOR MANUFACTURING SILICON
摘要 PURPOSE:To provide an Si manufacturing apparatus in which secondarily produced fine powder Si is removed surely by relatively simple constitution also without danger of dust explosion, by constituting the apparatus in which fine powder Si, etc. especially produced secondarily in reaction chamber is oxidized, then sucked and sent into wet type sucking machine, and water is sprayed on the fine powder Si. CONSTITUTION:When gaseous raw material contg. Si is decomposed in the reaction chamber 1 to accumulate Si on base body, secondarily produced fine powder Si, remaining unreacting gaseous raw material and gaseous by-products are sucked 15, oxidizing treated 3, then introduced to a wet type collector 4. In this case, said fine powder Si is sucked by a sucking nozzle 10 whose top end is made thinner, sucking state is produced e.g. through a flexible tube 11A, a piping 11B and a blower 8. Further, water is sprayed 51 on the sucked 15 fine powder Si, water to be supplied to the nozzle 10 is sprayed therein under reduced pressure. By the constitution together with said effect, the fine powder Si can be removed efficiently through the collector 4 without generating environmental pollution.
申请公布号 JPS6123758(A) 申请公布日期 1986.02.01
申请号 JP19840143792 申请日期 1984.07.10
申请人 TOSHIBA CORP 发明人 YOSHIZAWA HIDEJI
分类号 C23C16/24;C23C16/44;G03G5/08;G03G5/082 主分类号 C23C16/24
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