发明名称 Electron gun.
摘要 <p>An electron gun for producing and directing at least one electron beam along a beam path comprises a beam forming section (6, 9, 11, 12) and a main lens section for focusing the electron beam. The main lens section includes first and second electrodes (13,14) arranged along the beam path and each having an aperture through which the electron beam is passed, and an auxiliary electrode (16) located between the first and second electrodes (13, 14) and having an aperture through which the electron beam is passed. The aperture of the auxiliary electrode (16) is wider than those of the first and second electrodes (13, 14). Different voltages are applied to the first and second electrodes (13, 14), and the auxiliary voltage between the voltages is applied to the auxiliary electrode (16). An electrostatic field formed between the first and second electrodes and under the influence of the auxiliary voltage is corrected by a correcting electrode (113, 114)</p>
申请公布号 EP0169531(A2) 申请公布日期 1986.01.29
申请号 EP19850109154 申请日期 1985.07.22
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KAMOHARA, EIJI C/O PATENT DIVISION
分类号 H01J29/56;H01J29/48;H01J29/50;(IPC1-7):H01J29/48;H01J29/62 主分类号 H01J29/56
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