发明名称 METHOD FOR EXPOSING MATERIAL OF SEMICONDUCTOR WAFER BY MERCURY LAMP
摘要 PURPOSE:To carry out a stable exposure for a long term by preventing the wear of an electrode by effecting a switching from a low-power step to a high-power step in a mercury lamp under the condition that 95% of the level is attained in 1-30msec. CONSTITUTION:A shutter 4 is in an open state only for the predetermined time under the condition that a mercury lamp 1 has been lighted during the first step A in which an electric power consumption becomes high level. The condition is shifted to one that the mercury lamp 1 is lighted during the second step B in which the power consumption becomes low level, during which the shutter 4 is closed. The exposure is effected by relatively combining the first and second steps A and B, opening and closing operations of the shutter 4, and the step shift of a material 2 of a semiconductor wafer. Swiching of the step from B to A is effected under the condition that the power consumption of the mercury lamp 1 reaches 95% of the high level in the step A in 1-30msec. Consequently, the early wear of an electrode of the mercury lamp can be prevented.
申请公布号 JPS6120324(A) 申请公布日期 1986.01.29
申请号 JP19840139775 申请日期 1984.07.07
申请人 USHIO DENKI KK 发明人 KIRA TAKEHIRO
分类号 H05B41/42;G03F7/20;H01L21/027 主分类号 H05B41/42
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