| 摘要 |
PURPOSE:To eliminate the unstableness and non-efficiency in the detection of the end point of photoresist development by connecting a connecting means consisting of a metallic material to a metallic film through the resist of an exposed substrate to make one electrode, using a material consisting of a metallic material different from said metallic material as the other electrode and dipping said material into a developing soln. CONSTITUTION:The developing soln. 2 consisting essentially of, for example, sodium hydroxide, is incorporated in a vessel 1 and the substrate 3 consisting of, for example, silicon, disposed with, for example, an aluminum layer 21 deposited by evaporation and a photoresist (photoresist 23 and unexposed photoresist 22) completed of an exposing stage on the aluminum layer and a platinum wire 4 are dipped in the soln. 2. The aluminum wire provided with a holder 5 at the top end is brought into contact with the aluminum layer on the substrate 3 by breaking through the resist film to make one electrode and the wire 4 is used as the other electrode in order to monitor the progressing condition of the development by the soln. 2 in the exposed part 23 on the substrate 3. Lead wires 7a and 7b are connected to the respective top ends of the aluminum wire 6 and the platinum wire 4 and are connected to an amplifier 9. |
