发明名称 Exposure control apparatus based on a multimetering system
摘要 A meter sensitivity pattern control method for cameras in which an output of a first light metering circuit for the brightness of an object of principal photographic interest is compared with outputs of a plurality of second light metering circuits for brightness of different portions of the environment surrounding the object by a corresponding number of comparing circuits. Thereby one second light metering circuit having an output which lies in a predetermined range different from the output of the first light metering circuit and another second light metering circuit having an output which lies outside the predetermined range are selected for their different contributions to an exposure value. The thus-differentially weighed outputs of the second light metering circuits are computed with the output of the first light metering circuit producing light value information.
申请公布号 US4566775(A) 申请公布日期 1986.01.28
申请号 US19850736540 申请日期 1985.05.21
申请人 CANON KABUSHIKI KAISHA 发明人 TSUNEKAWA, TOKUICHI
分类号 G03B7/099;G03B7/28;(IPC1-7):G03B7/08 主分类号 G03B7/099
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