发明名称 |
Heat and impact resistant resin composition |
摘要 |
A heat and impact resistant resin composition which comprises from 10 to 90 parts by weight of a copolymer (A) comprising from 90 to 50% of residues of a vinyl aromatic compound, from 10 to 50% of residues of a maleimide compound and from 0 to 30% of residues of a vinyl compound copolymerizable therewith; from 0 to 50 parts by weight a copolymer (B) comprising from 90 to 40% of residues of a vinyl aromatic compound and from 10 to 60% of residues of an unsaturated nitrile compound; from 5 to 89 parts by weight of a graft copolymer (C) comprising from 25 to 70% by weight of particles of a rubber having a glass transition temperature of not higher than 0 DEG C. and an average particle size of from 0.1 to 0.5 mu m and from 75 to 30% by weight of a matrix resin comprising from 90 to 40% of residues of a vinyl aromatic compound and from 10 to 60% of residues of an unsaturated nitrile compound; and from 1 to 45 parts by weight of a graft copolymer (D) comprising from 2 to 17% by weight of particles of a rubber having a glass transition temperature of not higher than 0 DEG C. and an average particle size of from 0.7 to 4 mu m and from 98 to 83% by weight of a matrix resin comprising from 90 to 40% of residues of a vinyl aromatic compound and from 10 to 60% of residues of an unsaturated nitrile compound, wherein the amount of the graft copolymer (C) is from 97 to 50% by weight of the total amounts of the graft copolymers (C) and (D).
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申请公布号 |
US4567233(A) |
申请公布日期 |
1986.01.28 |
申请号 |
US19840575298 |
申请日期 |
1984.01.30 |
申请人 |
MITSUBISHI MONSANTO CHEMICAL COMPANY |
发明人 |
TOMONO, HIROMI;KOKUBO, TAKASHI;YAMAGUCHI, KAZUKI;IKUMA, SADAO |
分类号 |
C08L33/00;C08L7/00;C08L21/00;C08L23/00;C08L25/12;C08L33/02;C08L33/20;C08L33/24;C08L35/06;C08L51/00;C08L51/02;C08L51/04;C08L55/00;C08L101/00;(IPC1-7):C08L51/04 |
主分类号 |
C08L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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