发明名称 PHOTOSENSITIVE MATERIAL
摘要 PURPOSE:To obtain a back layer having high scratch resistance with a water soluble polymer by forming a photosensitive silver halide layer on one side of a plastic film support and a backing layer contg. water soluble polyester on the other side. CONSTITUTION:The photosensitive silver halide layer is formed on one side of the plastic film support, and at least one backing layer contg. water soluble polyester is formed on the other side to manufacture a photosensitive material. The plastic film support it made of cellulose triacetate, polyethylene terephthalate, polyethylene or the like. The preferred amount of the water soluble polyester used is 0.01-10g/m<2>, and the polyester is blended with a matting agent, a surfactant, etc. as required. The water soluble polyester layer may be coated with a cellulose deriv. according to the purpose.
申请公布号 JPS6118943(A) 申请公布日期 1986.01.27
申请号 JP19840139541 申请日期 1984.07.05
申请人 FUJI SHASHIN FILM KK 发明人 SUEMATSU KOUICHI;YAMAGUCHI JIYUN;KAWAGUCHI HIDEO
分类号 G03C1/76 主分类号 G03C1/76
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